As the base material of integrated circuits, silicon wafers have the characteristics of controllable resistivity and oxygen-carbon content. The single crystal ingot undergoes wire cutting, grinding, polishing, cleaning and other processes to obtain a silicon wafer with a specific thickness and geometric parameters and a clean surface.
As the base material of integrated circuits, silicon wafers have the characteristics of controllable resistivity and oxygen-carbon content. The single crystal ingot undergoes wire cutting, grinding, polishing, cleaning and other processes to obtain a silicon wafer with a specific thickness and geometric parameters and a clean surface.